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Proceedings Paper

Optical and thin film properties of mixed oxides deposited by pulsed reactive magnetron sputtering
Author(s): Stefan Bruns; Michael Vergöhl
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Paper Abstract

Reactive magnetron sputtering was used to deposit optical thin films. In order to obtain high deposition rates, metallic targets were used. For the creation of mixed oxides bipolar pulsed sputtering was applied to two different targets. A new process control setup was developed to monitor the oxidation state of both targets individually. Two different elemental targets are co-sputtered in oxygen-argon atmosphere within the lambda-probe stabilized transition mode. The composition is controlled by optical emission spectroscopy. Thus different mixtures are accessible without changing target material. Varied mixtures in the system hafnia-silica have been prepared. The optical properties (refractive indices, absorption, surface roughness, density) as well as mechanical behavior (film stress, hardness) of the mixtures are compared to pure oxide materials. By mixing the oxides thin film quality can be improved beyond the properties of the single materials.

Paper Details

Date Published: 3 October 2011
PDF: 9 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 81680N (3 October 2011); doi: 10.1117/12.896838
Show Author Affiliations
Stefan Bruns, Fraunhofer Institute for Surface Engineering and Thin Films IST (Germany)
Michael Vergöhl, Fraunhofer Institute for Surface Engineering and Thin Films IST (Germany)

Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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