Share Email Print

Proceedings Paper

Two-dimensional thickness measurement of a dielectric thin layer on a metal by use of surface-plasmon-resonance-based ellipsometry
Author(s): Tetsuo Iwata; Yusuke Wada; Kentaro Nishigaki; Yasuhiro Mizutani
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In order to carry out precise measurements of the thickness of a dielectric layer deposited on a metal surface two-dimensionally, we have introduced an ellipsometric measurement technique (EMT) to a new modified Otto configuration (MOC) that is used for observing surface plasmon resonance (SPR). In the conventional MOC, a planoconvex coupling singlet lens contacting with the planer air-metal interface at a one point was used, by which the SPR reflectance dip was formed as a two-dimensional circular fringe pattern. In the new MOC, in order to avoid the unnecessary physical contact between the dielectric layer and the lens, we inserted a thin air gap layer between them. In addition, we replaced the planoconvex lens by a cylindrical lens to enlarge the measurement area. By the cylindrical coupling lens, two parallel-straight-lined SPR dips were formed. On the locations of the two dips, we were able to carry out precise measurements of the thickness of the dielectric layer. We first measured the thickness of the Au layer basing on a fourlayer structure model: prism (BK7)-air-Au-substrate (BK7). Then we measured that of a TiO2 layer deposited on the Au layer basing on a five-layer structure model: prism (BK7)-air-TiO2-Au-substrate (BK7). We have proved experimentally that the combination of the EMT and the new MOC is effective for precise two-dimensional measurements of the thickness of the dielectric layer deposited on the metal surface.

Paper Details

Date Published: 30 September 2011
PDF: 8 pages
Proc. SPIE 8169, Optical Fabrication, Testing, and Metrology IV, 816913 (30 September 2011); doi: 10.1117/12.896767
Show Author Affiliations
Tetsuo Iwata, Univ. of Tokushima (Japan)
Yusuke Wada, Univ. of Tokushima (Japan)
Kentaro Nishigaki, Univ. of Tokushima (Japan)
Yasuhiro Mizutani, Univ. of Tokushima (Japan)

Published in SPIE Proceedings Vol. 8169:
Optical Fabrication, Testing, and Metrology IV
Angela Duparré; Roland Geyl, Editor(s)

© SPIE. Terms of Use
Back to Top