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Proceedings Paper

Mg-based multilayers and their thermal stabilities for EUV range
Author(s): Jingtao Zhu; Sika Zhou; Haochuan Li; Qiushi Huang; Li Jiang; Fengli Wang; Zhong Zhang; Zhanshan Wang; Hongjun Zhou; Tonglin Huo
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Paper Abstract

We have investigated the optical properties and thermal stabilities of a serial of Mg-based multilayers including Mg/SiC, Mg/Co and Mg/Zr in extreme ultraviolet (EUV) range. Mg/X multilayer mirrors were deposited by magnetron sputtering technique onto polished silicon wafers. In order to study their stabilities under heat resistance, annealing experiments were carried out in vacuum environment keeping 1hour at different temperatures from 200°C to 550°C. Their EUV reflectivities were measured by using synchrotron radiation. Grazing incident X-ray and EUV reflection measurements were used to estimate the thermal stability of these multilayer systems. Mg/SiC and Mg/Co are stable up to 200°C and the reflectivity decreases drastically with the increase of temperature, while the reflectivity of Mg/Zr keeps constant during annealing at 300°C and falls slowly as the temperature increases. Up to 550°C, Bragg peaks of Mg/Zr multilayer are still sharp in X-ray reflectivity curve, and EUV reflectivity is 25% at 26.2nm at 30 degree incidence. These measurement results indicate that Mg/Co and Mg/SiC should be used in application requiring no heating above 200°C, while the new material combination Mg/Zr is a promising multilayer for practical application requiring stronger heat resistance in EUV range.

Paper Details

Date Published: 4 October 2011
PDF: 7 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 81681C (4 October 2011); doi: 10.1117/12.896405
Show Author Affiliations
Jingtao Zhu, Tongji Univ. (China)
Sika Zhou, Tongji Univ. (China)
Haochuan Li, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Li Jiang, Tongji Univ. (China)
Fengli Wang, Tongji Univ. (China)
Zhong Zhang, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)
Hongjun Zhou, Univ. of Science and Technology of China (China)
Tonglin Huo, Univ. of Science and Technology of China (China)

Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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