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Proceedings Paper

Optimization of ion-assisted ITO films by design of experiment
Author(s): Silvia Schwyn Thöny; Jürgen Buchholz; Stephan Waldner
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Paper Abstract

In this work we want to demonstrate how the methodology of Design of Experiment (DOE) can be used for the development of ion-assisted ITO films deposited at low temperatures. The optimization method allows us to identify the process parameters, which yield films with high transmittance and low resistivity. The article will show the results obtained for transmittance and resistivity. Furthermore, the dispersion of the refractive index and the extinction coefficient will be determined as well as the surface roughness. In ITO there is a trade-off between transmittance / absorbance and sheet resistance. Virtually absorption free films could be obtained with a resistivity of 3.2 μΩm, whereas the lowest resistivity (2.7 μΩm) yielded a transmittance, which was reduced by a few percent.

Paper Details

Date Published: 3 October 2011
PDF: 8 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 81681H (3 October 2011); doi: 10.1117/12.896398
Show Author Affiliations
Silvia Schwyn Thöny, Evatec Ltd. (Switzerland)
Jürgen Buchholz, Evatec Ltd. (Switzerland)
Stephan Waldner, Evatec Ltd. (Switzerland)

Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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