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Proceedings Paper

The optics system of the New Hard X-ray Mission: status report
Author(s): Stefano Basso; Giovanni Pareschi; Oberto Citterio; Daniele Spiga; Gianpiero Tagliaferri; Lorenzo Raimondi; Giorgia Sironi; Vincenzo Cotroneo; Bianca Salmaso; Barbara Negri; Primo Attinà; Giuseppe Borghi; Alessandro Orlandi; Dervis Vernani; Giuseppe Valsecchi; Riccardo Binda; Fabio Marioni; Stefano Moretti; Moreno Castelnuovo; Wolfgang Burkert; Michael J. Freyberg; Vadim Burwitz
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Paper Abstract

The New Hard X-ray Mission (NHXM) is a space X-ray telescope project focused on the 0.2 to 80 keV energy band, coupled to good imaging, spectroscopic and polarimetry detectors. The mission is currently undergoing the Phase B study and it has been proposed to ESA as a small-size mission to be further studied in the context of the M3 call; even if the mission was not downselected for this call, its study is being continued by ASI. The required performance is reached with a focal length of 10 m and with four mirror modules, each of them composed of 70 NiCo electroformed mirror shells. The reflecting coating is a broadband graded multilayer film, and the focal plane is mounted onto an extensible bench. Three of the four modules are equipped with a camera made of two detectors positioned in series, a Silicon low energy detector covering the range 0.2 to 15 keV and a high energy detector based on CdTe sensitive from 10 keV up to 120 keV. The fourth module is dedicated to the polarimetry to be performed with enhanced imaging capabilities. In this paper the latest development in the design and manufacturing of the optics is presented. The design has been optimized in order to increase as much as possible the effective area in the high-energy band. The manufacturing of the mirror shells benefits from the latest development in the mandrel production (figuring and polishing), in the multilayer deposition and in the integration improvements.

Paper Details

Date Published: 30 September 2011
PDF: 12 pages
Proc. SPIE 8147, Optics for EUV, X-Ray, and Gamma-Ray Astronomy V, 814709 (30 September 2011);
Show Author Affiliations
Stefano Basso, INAF - Osservatorio Astronomico di Brera (Italy)
Giovanni Pareschi, INAF - Osservatorio Astronomico di Brera (Italy)
Oberto Citterio, INAF - Osservatorio Astronomico di Brera (Italy)
Daniele Spiga, INAF - Osservatorio Astronomico di Brera (Italy)
Gianpiero Tagliaferri, INAF - Osservatorio Astronomico di Brera (Italy)
Lorenzo Raimondi, INAF - Osservatorio Astronomico di Brera (Italy)
Giorgia Sironi, INAF - Osservatorio Astronomico di Brera (Italy)
Vincenzo Cotroneo, INAF - Osservatorio Astronomico di Brera (Italy)
Bianca Salmaso, INAF - Osservatorio Astronomico di Brera (Italy)
Barbara Negri, Agenzia Spaziale Italiana (Italy)
Primo Attinà, Thales Alenia Space (Italy)
Giuseppe Borghi, Media Lario Technologies (Italy)
Alessandro Orlandi, Media Lario Technologies (Italy)
Dervis Vernani, Media Lario Technologies (Italy)
Giuseppe Valsecchi, Media Lario Technologies (Italy)
Riccardo Binda, Media Lario Technologies (Italy)
Fabio Marioni, Media Lario Technologies (Italy)
Stefano Moretti, Media Lario Technologies (Italy)
Moreno Castelnuovo, Media Lario Technologies (Italy)
Wolfgang Burkert, Max-Planck-Institut für extraterrestrische Physik (Germany)
Michael J. Freyberg, Max-Planck-Institut für extraterrestrische Physik (Germany)
Vadim Burwitz, Max-Planck-Institut für extraterrestrische Physik (Germany)

Published in SPIE Proceedings Vol. 8147:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy V
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)

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