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Proceedings Paper

New x-ray nanofocusing devices based on total-reflection zone plates
Author(s): H. Takano; T. Tsuji; Y. Kagoshima
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Paper Abstract

X-ray nanofocusing devices are capable of focusing X-rays down to sizes of about 10 nm. We have developed a new nanofocusing device, known as total-reflection zone plates (TRZPs), for focusing high-brilliance synchrotron radiation in the hard x-ray region. This device consists of a reflective zone pattern on a flat substrate. It has the potential to focus hard x-rays down to sub-10-nm dimensions. Furthermore, it is considerably easier to fabricate than other hard x-ray nanofocusing devices since it is used with a very small grazing incidence angle. We have focused 10-keV x-rays to sub-15 nm dimensions using a TRZP that was fabricated by conventional electron-beam lithography. In addition, we present designs for more efficient devices that have a target focus size of 5 nm. We propose and discuss a new approach for achieving point focusing with nanometer dimensions.

Paper Details

Date Published: 28 September 2011
PDF: 9 pages
Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390D (28 September 2011); doi: 10.1117/12.892678
Show Author Affiliations
H. Takano, Univ. of Hyogo (Japan)
T. Tsuji, Univ. of Hyogo (Japan)
Japan Synchrotron Radiation Research Institute (Japan)
Y. Kagoshima, Univ. of Hyogo (Japan)

Published in SPIE Proceedings Vol. 8139:
Advances in X-Ray/EUV Optics and Components VI
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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