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Proceedings Paper

Ablation of ionic crystals induced by capillary-discharge XUV laser
Author(s): Peter Pira; Tomáš Burian; Ludék Vyšín; Jaromír Chalupský; Ján Lančok; Jan Wild; Michal Střižík; Zdeněk Zelinger; Jorge J Rocca; Libor Juha
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Paper Abstract

Single crystals of two fluorides (LiF and CaF2) and a tungstate (PbWO4) were irradiated by nanosecond pulses of 46.9- nm radiation provided by 10-Hz capillary-discharge Ne-like Ar laser (CDL). The damage threshold was determined in LiF using the CDL beam focused by a Sc/Si multilayer-coated spherical mirror. Irradiated samples have been investigated by Nomarski (DIC - Differential Interference Contrast) microscopy and optical (WLI - white light intereferometry) profiler. After an exposure by a certain number of CDL pulses, an ablation rate can be calculated from WLI measured depth of the crater created by the XUV ablation. Potential use of XUV ablation of ionic crystals in pulsed laser deposition (PLD) of thin layers of such a particular material, which is difficult to ablate by conventional UV-Vis- NIR lasers, is discussed in this contribution.

Paper Details

Date Published: 23 May 2011
PDF: 7 pages
Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 807719 (23 May 2011); doi: 10.1117/12.890406
Show Author Affiliations
Peter Pira, Charles Univ. in Prague (Czech Republic)
Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Tomáš Burian, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Ludék Vyšín, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Jaromír Chalupský, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Ján Lančok, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Jan Wild, Charles Univ. in Prague (Czech Republic)
Michal Střižík, Technical Univ. Ostrava (Czech Republic)
Zdeněk Zelinger, J. Heyrovský Institute of Physical Chemistry (Czech Republic)
Jorge J Rocca, Colorado State Univ. (United States)
Libor Juha, Institute of Physics of the ASCR, v.v.i. (Czech Republic)


Published in SPIE Proceedings Vol. 8077:
Damage to VUV, EUV, and X-ray Optics III
Libor Juha; Saša Bajt; Richard A. London, Editor(s)

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