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Proceedings Paper

Damage formation and characterization with scanning photoemission spectromicroscopy
Author(s): L. Gregoratti; M. Amati; M. K. Abyaneh
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Paper Abstract

Scanning photoemission spectromicroscopy is a powerful tool for the chemical characterization of materials based on third generation synchrotron light sources. Due to the X-ray focalization properties it represents also an extremely bright source of radiation ideal for the investigation of radiation effects on matter. Despite the experiments involving inorganic materials, such as oxides, lead in the last decade have already shed light on the potentials of this techniques to perform lateral resolved chemical analysis, still there is a lack of information concerning the possibilities to measure organic compounds. This paper reports on the investigation of inorganic (Rh oxide thin films) and organic (polymers) samples performed with the scanning photoemission microscope hosted at the Elettra Synchrotron Light Laboratory. Results show that the typical photon densities in the focused spot of the microscope allow the investigation of the oxide films but produce an immediate damaging of the polymeric film.

Paper Details

Date Published: 18 May 2011
PDF: 9 pages
Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 80770K (18 May 2011); doi: 10.1117/12.887834
Show Author Affiliations
L. Gregoratti, Sincrotrone Trieste S.C.p.A. (Italy)
M. Amati, Sincrotrone Trieste S.C.p.A. (Italy)
M. K. Abyaneh, Sincrotrone Trieste S.C.p.A. (Italy)

Published in SPIE Proceedings Vol. 8077:
Damage to VUV, EUV, and X-ray Optics III
Libor Juha; Saša Bajt; Richard A. London, Editor(s)

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