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Proceedings Paper

Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining
Author(s): Tetsuya Makimura; Shuichi Torii; Kota Okazaki; Daisuke Nakamura; Akihiko Takahashi; Hiroyuki Niino; Tatsuo Okada; Kouichi Murakami
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Paper Abstract

We have investigated responses of PDMS, PMMA and acrylic block copolymers (BCP) to EUV light from laserproduced plasma beyond ablation thresholds and micromachining. We generated wide band EUV light around 100 eV by irradiation of Ta targets with Nd:YAG laser light. In addition, narrow band EUV light at 11 and 13 nm were generated by irradiation of solid Xe and Sn targets, respectively, with pulsed CO2 laser light. The generated EUV light was condensed onto samples, using an ellipsoidal mirror. The EUV light was incident through windows of contact masks on the samples. We found that through-holes with a diameter of 1 μm can be fabricated in PDMS sheets with thicknesses of 10 μm. PDMS sheets are ablated if they are irradiated with EUV light beyond a threshold power density, while PDMS surfaces were modified by irradiation with the narrow band EUV light at lower power densities. Effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals using the practical apparatus. Furthermore, BCP sheets were ablated to have micro-structures. Thus, we have developed a practical technique for microma chining of PMMA, PDMS and BCP sheets in a micrometer scale.

Paper Details

Date Published: 18 May 2011
PDF: 10 pages
Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 80770F (18 May 2011); doi: 10.1117/12.887615
Show Author Affiliations
Tetsuya Makimura, Univ. of Tsukuba (Japan)
Shuichi Torii, Univ. of Tsukuba (Japan)
Kota Okazaki, Kyushu Univ. (Japan)
Daisuke Nakamura, Kyushu Univ. (Japan)
Akihiko Takahashi, Kyushu Univ. (Japan)
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)
Tatsuo Okada, Kyushu Univ. (Japan)
Kouichi Murakami, Univ. of Tsukuba (Japan)

Published in SPIE Proceedings Vol. 8077:
Damage to VUV, EUV, and X-ray Optics III
Libor Juha; Saša Bajt; Richard A. London, Editor(s)

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