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Proceedings Paper

Reduction of micro-bridging defects for 193nm immersion resist
Author(s): Lijing Gou; Vinay Nair; Hiroyuki Mori; Adam Olson; David Swindler; Anton Devilliers
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Paper Abstract

Factors such as post-develop hydrophobicity, polymer aggregation and acid diffusion length are driving forces in the formation of micro bridging defects. In this report, solutions for each possible cause are proposed and tested. It is proven that micro-bridging levels can be significantly reduced through a multi-tiered approach.

Paper Details

Date Published: 15 April 2011
PDF: 6 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721P (15 April 2011); doi: 10.1117/12.881546
Show Author Affiliations
Lijing Gou, Micron Technology, Inc. (United States)
Vinay Nair, Micron Technology, Inc. (United States)
Hiroyuki Mori, Micron Technology, Inc. (United States)
Adam Olson, Micron Technology, Inc. (United States)
David Swindler, Micron Technology, Inc. (United States)
Anton Devilliers, Micron Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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