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Proceedings Paper

An aberration control of projection optics for multi-patterning lithography
Author(s): Yasuhiro Ohmura; Taro Ogata; Toru Hirayama; Hisashi Nishinaga; Takeshi Shiota; Satoshi Ishiyama; Susumu Isago; Hidetaka Kawahara; Tomoyuki Matsuyama
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Paper Abstract

In order to realize further improvement of productivity of semiconductor manufacturing, higher throughput and better imaging performance are required for the exposure tool. Therefore, aberration control of the projection lens is becoming more and more important not only for cool status performance but also heating status. In this paper, we show the improvements of cool status lens aberration, including scalar wavefront performance and polarization aberration performance. We also discuss various techniques for controlling thermal aberrations including reduction of heat in the lens, simulation, compensating knob, and adjusting method with actual imaging performance data during heating and cooling.

Paper Details

Date Published: 22 March 2011
PDF: 11 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79730W (22 March 2011);
Show Author Affiliations
Yasuhiro Ohmura, Nikon Corp. (Japan)
Taro Ogata, Nikon Corp. (Japan)
Toru Hirayama, Nikon Corp. (Japan)
Hisashi Nishinaga, Nikon Corp. (Japan)
Takeshi Shiota, Nikon Corp. (Japan)
Satoshi Ishiyama, Nikon Corp. (Japan)
Susumu Isago, Nikon Corp. (Japan)
Hidetaka Kawahara, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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