
Proceedings Paper
Characterization of pixel crosstalk and impact of Bayer patterning by quantum efficiency measurementFormat | Member Price | Non-Member Price |
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Paper Abstract
Development of small pixels for high resolution image sensors implies a lot of challenges. A high level of performance
should be guaranteed whereas the overall size must be reduced and so the degree of freedom in design
and process. One key parameter of this constant improvement is the knowledge and the control of the crosstalk
between pixels. In this paper, we present an advance in crosstalk characterization method based on the design of
specific color patterns and the measurement of quantum efficiency. In a first part, we describe the color patterns
designed to isolate one pixel or to simulate un-patterned colored pixels. These patterns have been implemented
on test-chip and characterized. The second part deals with the characterization setup for quantum efficiency.
Indeed, the use of spectral measurements allows us to discriminate pixels based on the color filter placed on
top of them and to probe the crosstalk as a function of the depth in silicon, thanks to the photon absorption
length variation with the wavelength. In the last part, results are presented showing the impact of color filters
patterning, i.e. pixels in a Bayer pattern versus un-patterned pixels. The crosstalk directions and amplitudes
are also analyzed in relation to pixel layout.
Paper Details
Date Published: 24 January 2011
PDF: 10 pages
Proc. SPIE 7876, Digital Photography VII, 787613 (24 January 2011); doi: 10.1117/12.879603
Published in SPIE Proceedings Vol. 7876:
Digital Photography VII
Francisco H. Imai; Feng Xiao, Editor(s)
PDF: 10 pages
Proc. SPIE 7876, Digital Photography VII, 787613 (24 January 2011); doi: 10.1117/12.879603
Show Author Affiliations
Jérôme Vaillant, STMicroelectronics (France)
Clémence Mornet, STMicroelectronics (France)
Institut de Microélectronique, Electromagnétisme et Photonique (France)
Thomas Decroux, STMicroelectronics (France)
Clémence Mornet, STMicroelectronics (France)
Institut de Microélectronique, Electromagnétisme et Photonique (France)
Thomas Decroux, STMicroelectronics (France)
Didier Hérault, STMicroelectronics (France)
Isabelle Schanen, Institut de Microélectronique, Electromagnétisme et Photonique (France)
Isabelle Schanen, Institut de Microélectronique, Electromagnétisme et Photonique (France)
Published in SPIE Proceedings Vol. 7876:
Digital Photography VII
Francisco H. Imai; Feng Xiao, Editor(s)
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