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Proceedings Paper

Tunable two-mirror laser interference lithography system for large-area nano-patterning
Author(s): Weidong Mao; Ishan Wathuthanthri; Chang-Hwan Choi
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Paper Abstract

A novel laser interference lithography system with enhanced tunablility in pattern periodicity and coverage has been designed and tested for large-area nano-patterning in a wide range of a pattern frequency. The tunable feature has been achieved by using two rotational mirrors on expanded beam paths at specific angles for a designed period. With a 325 nm laser wavelength, uniform resist nano-patterns of 250, 500, and 750 nm have been experimentally demonstrated on a 4-inch silicon substrate. This new interferometer configuration offers a convenient and robust way to prepare large-area nanostructures with superior tunability in pattern periods.

Paper Details

Date Published: 4 April 2011
PDF: 8 pages
Proc. SPIE 7970, Alternative Lithographic Technologies III, 79701K (4 April 2011); doi: 10.1117/12.879576
Show Author Affiliations
Weidong Mao, Stevens Institute of Technology (United States)
Ishan Wathuthanthri, Stevens Institute of Technology (United States)
Chang-Hwan Choi, Stevens Institute of Technology (United States)

Published in SPIE Proceedings Vol. 7970:
Alternative Lithographic Technologies III
Daniel J. C. Herr, Editor(s)

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