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Proceedings Paper

Influence of the illumination source on model-based SRAF placement
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Paper Abstract

Sub-Resolution Assist Features (SRAFs) have been extensively used to improve the process margin for isolated and semi-isolated features. It has been shown that compared to rule-based SRAFs, model-based placement of SRAFs can result in better overall process window. Various model-based approaches have been reported to affect SRAF placements. Even with model-based solutions, the complexity of two-dimensional layouts results in SRAF placement conflicts, producing numerous challenges to optimal SRAF placement for each pattern configuration. Furthermore, tuning of SRAF placement algorithms becomes challenging with varying patterns and sources [1-3]. Recently, pixelated source in optical lithography has become the subject of increased exploration to enable 22/20 nm technology nodes and beyond. Optimization of the illumination shape, including free-form pixelated sources, has shown performance gains, compared to standard source shapes [4-6]. This paper will demonstrate the influence of such different free-form sources as well as conventional sources on model-based SRAF placement. Typically in source optimization, the selection of the optimization patterns is exigent since it drives the source solution. Small differences in the selected patterns produce subtle changes in the optimized source shapes. It has also been previously reported that SRAF placements are significantly dependent on the illumination [1]. In this paper, the impact of changes in the design and/or source optimization patterns on the optimized source and hence on the SRAF placement is reported. Variations in SRAF placements will be quantified as a function of change in the free-form sources. Lithographic performance of the different SRAF placement schema will be verified using simulation.

Paper Details

Date Published: 22 March 2011
PDF: 8 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731U (22 March 2011); doi: 10.1117/12.879492
Show Author Affiliations
Rachit Gupta, Mentor Graphics Corp. (United States)
Aasutosh Dave, Mentor Graphics Corp. (United States)
Edita Tejnil, Mentor Graphics Corp. (United States)
Srividya Jayaram, Mentor Graphics Corp. (United States)
Pat LaCour, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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