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Proceedings Paper

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography
Author(s): Hiroshi Umeda; Hiroaki Tsushima; Hidenori Watanabe; Satoshi Tanaka; Masaya Yoshino; Shinich Matsumoto; Hiroshi Tanaka; Akihiko Kurosu; Yasufumi Kawasuji; Takashi Matsunaga; Junichi Fujimoto; Hakaru Mizoguchi
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Paper Abstract

ArF immersion technology has been used widely in volume production for 45nm node. For 32nm node and beyond, double patterning technology with ArF immersion lithography is considered to be the main stream solution until EUV is ready. Our target is to reduce CoO(Cost of ownership) and we aim to develop for ecology and high durability laser. We will introduce the latest performance data of the laser built for ArF immersion lithography under the EcoPhoton concept. Eco-photon concept: -CoC (Cost of Consumable) -CoD (Cost of Downtime) -CoE(Cost of Energy & Environment) We have developed flexible and high power injection-lock ArF excimer laser for double patterning, GT62A-1SxE (Max90W/6000Hz/Flexible power with 10-15mJ/0.30pm (E95)) based on the GigaTwin platform5). A number of innovative and unique technologies are implemented on GT62A-1SxE. In addition, GT62A-1SxE is the laser matching the enhancement technology of advanced illumination systems. For example, in order to provide illumination power optimum for resist sensitivity, it has extendable power from 60W to 90W. We have confirmed durability under these concept with the regulated operation condition with flexible power 60-90W. We show the high durability data of GT62A-1SxE with Eco-Photon concept. In addition to the results the field reliability and availability of our Giga Twin series (GT6XA). We also show technologies which made these performances and its actual data. A number of innovative and unique technologies are implemented on GT62A.

Paper Details

Date Published: 22 March 2011
PDF: 9 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731K (22 March 2011); doi: 10.1117/12.879205
Show Author Affiliations
Hiroshi Umeda, Gigaphoton Inc. (Japan)
Hiroaki Tsushima, Gigaphoton Inc. (Japan)
Hidenori Watanabe, Gigaphoton Inc. (Japan)
Satoshi Tanaka, Gigaphoton Inc. (Japan)
Masaya Yoshino, Gigaphoton Inc. (Japan)
Shinich Matsumoto, Gigaphoton Inc. (Japan)
Hiroshi Tanaka, Gigaphoton Inc. (Japan)
Akihiko Kurosu, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Takashi Matsunaga, Gigaphoton Inc. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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