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Proceedings Paper

Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced high-NA lithography
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Paper Abstract

Evanescent-wave imaging is demonstrated using solid-immersion Lloyd's-mirror interference lithography (SILMIL) at λ = 325 nm to produce 44-nm half-pitch structures (numerical aperture, NA = 1.85). At such an ultra-high NA the image depth is severely compromised due to the evanescent nature of the exposure, and the use of reflections from plasmonic under-layers is discussed as a possible solution. Simulations and modelling show that image depths in excess of 100 nm should be possible with such a system, using silver as the plasmonic material. The concept is scalable to 193 nm illumination using aluminium as the plasmonic reflector, and simulation results are shown for 26-nm half-pitch imaging into a 37-nm thick resist layer using this scheme.

Paper Details

Date Published: 4 April 2011
PDF: 12 pages
Proc. SPIE 7970, Alternative Lithographic Technologies III, 79701L (4 April 2011); doi: 10.1117/12.879121
Show Author Affiliations
Prateek Mehrotra, Univ. of Canterbury (New Zealand)
Charles W. Holzwarth, Univ. of Canterbury (New Zealand)
Richard J. Blaikie, Univ. of Canterbury (New Zealand)

Published in SPIE Proceedings Vol. 7970:
Alternative Lithographic Technologies III
Daniel J. C. Herr, Editor(s)

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