Proceedings Paper
High-performance intensity slope correction method for global process variability band improvement and printability enhancement in RET applications| Format | Member Price | Non-Member Price |
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Paper Abstract
A qualitatively new method applicable for process variability band (PVband) improvement and printability enhancement
in resolution enhancement technique (RET) applications is reported. The method does not use costly simulations through
the process window (PW). Instead, it utilizes a unique feedback mechanism derived from the intensity distribution
information available during nominal optical proximity correction (OPC) simulation. Consequently, this Intensity Slope
Correction (ISC) method provides superior performance as compared to traditional process window aware OPC tools.
Preliminary results are presented. They suggest that this method can successfully be applied for improvement of integral
PVband throughout the entire layout leading to global printability optimization.
Paper Details
Date Published: 22 March 2011
PDF: 6 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797318 (22 March 2011); doi: 10.1117/12.877594
Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)
PDF: 6 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797318 (22 March 2011); doi: 10.1117/12.877594
Show Author Affiliations
Sergiy M. Komirenko, Mentor Graphics Corp. (United States)
Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)
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