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Proceedings Paper

SU-8 focus control mirrors released by XeF2 dry etch
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Paper Abstract

SU8-2002 deformable membrane mirrors for primary focus control and compensation of focus-induced spherical aberration have been fabricated using a surface micromachining process with dry etching of silicon in XeF2. This process has a higher yield and realizes larger mirrors with a twofold improvement in stroke, relative to a wet release etch process previously described. The use of 3 mm x 4.24 mm elliptical mirrors for 45° incidence focus control in microscopy is described.

Paper Details

Date Published: 14 February 2011
PDF: 6 pages
Proc. SPIE 7930, MOEMS and Miniaturized Systems X, 793006 (14 February 2011); doi: 10.1117/12.877077
Show Author Affiliations
Sarah J. Lukes, Montana State Univ. (United States)
David L. Dickensheets, Montana State Univ. (United States)

Published in SPIE Proceedings Vol. 7930:
MOEMS and Miniaturized Systems X
Harald Schenk; Wibool Piyawattanametha, Editor(s)

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