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Proceedings Paper

An analytic expression for the field dependence of FRINGE Zernike polynomial coefficients in optical systems that are rotationally nonsymmetric
Author(s): Kevin P. Thompson; Kyle Fuerschbach; Jannick P. Rolland
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Paper Abstract

Zernike polynomials have emerged as the preferred method of characterizing as-fabricated optical surfaces. From here, over time, they have come to be used as a sparsely sampled representation of the state of alignment of assembled optical systems both during and at the conclusion of the alignment process. We previously developed the field dependence that analytically interconnects the coefficients of the Zernike polynomial (which has to-date been characterized only by its aperture dependence) as a more complete representation of an aligned, rotationally symmetric optical system. Here, we extend this analytic expression for the RMS wavefront error to encompass the prediction of the performance of a misaligned optical system by expressing the field dependence within the framework of nodal aberration theory. This significant expansion to this valuable polynomial provides an important new tool for characterizing high performance optical systems throughout the optical design, fabrication, assembly, and interim and acceptance test process.

Paper Details

Date Published: 9 November 2010
PDF: 11 pages
Proc. SPIE 7849, Optical Design and Testing IV, 784906 (9 November 2010); doi: 10.1117/12.876787
Show Author Affiliations
Kevin P. Thompson, Optical Research Associates (United States)
The Institute of Optics, Univ. of Rochester (United States)
Kyle Fuerschbach, The Institute of Optics, Univ. of Rochester (United States)
Jannick P. Rolland, The Institute of Optics, Univ. of Rochester (United States)

Published in SPIE Proceedings Vol. 7849:
Optical Design and Testing IV
Yongtian Wang; Julie Bentley; Chunlei Du; Kimio Tatsuno; Hendrik P. Urbach, Editor(s)

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