
Proceedings Paper
Detailed characterisation of a new large area CCD manufactured on high resistivity siliconFormat | Member Price | Non-Member Price |
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Paper Abstract
e2v technologies has developed "Hi-Rho" devices manufactured on very high resistivity silicon. Special design features
have been included that enable extremely high gate to substrate potentials to be applied without significant current
leakage between back and front substrate connections. The approach taken allows the usual design rules for low noise
output amplifier circuitry to be followed. Thus low noise devices very sensitive to red and near infrared wavelengths can
be manufactured. This paper reports on the detailed characterisation of the large format "Hi-Rho" sensor designed for
astronomical applications and extends the data previously reported to include detailed assessment of the CTE, spatial
resolution, dark signal and cosmetic quality. The influence of the base material has also been investigated with devices
manufactured on silicon from two different manufacturers. Measurements of the quantum efficiency from devices
utilising a newly developed antireflection coating process are presented.
Paper Details
Date Published: 16 February 2011
PDF: 12 pages
Proc. SPIE 7875, Sensors, Cameras, and Systems for Industrial, Scientific, and Consumer Applications XII, 787507 (16 February 2011); doi: 10.1117/12.876627
Published in SPIE Proceedings Vol. 7875:
Sensors, Cameras, and Systems for Industrial, Scientific, and Consumer Applications XII
Ralf Widenhorn; Valérie Nguyen, Editor(s)
PDF: 12 pages
Proc. SPIE 7875, Sensors, Cameras, and Systems for Industrial, Scientific, and Consumer Applications XII, 787507 (16 February 2011); doi: 10.1117/12.876627
Show Author Affiliations
Mark S. Robbins, e2v technologies Ltd. (United Kingdom)
Pritesh Mistry, e2v technologies Ltd. (United Kingdom)
Pritesh Mistry, e2v technologies Ltd. (United Kingdom)
Paul R. Jorden, e2v technologies Ltd. (United Kingdom)
Published in SPIE Proceedings Vol. 7875:
Sensors, Cameras, and Systems for Industrial, Scientific, and Consumer Applications XII
Ralf Widenhorn; Valérie Nguyen, Editor(s)
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