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Proceedings Paper

Photolithographic fabrication of slot waveguides
Author(s): Alexander Spott; Ran Ding; Tom Baehr-Jones; Woo-Joong Kim; Xugang Xiong; Richard Bojko; Jean-Marc Fedeli; Maryse Fournier; Michael Hochberg
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Paper Abstract

Silicon nano-slot waveguides have proven to be useful for a variety of applications, including nonlinear optics, biosensing, and electrooptic modulation. In particular, an electrooptic polymer clad, electrically contacted, strip-loaded slot waveguide design has been shown to be particularly useful for high-bandwidth electrooptic modulators. One of the significant challenges for many of the applications of these waveguides is the necessity of low waveguide losses. We demonstrate the ability to fabricate single mode strip-loaded slot waveguides, with losses as low as 6.5 dB/cm, using conventional stepper-based photolithography. Additionally, we discuss the benefits of an asymmetric slot waveguide design and present improved losses as low as 2 dB/cm for both asymmetric strip-loaded slot waveguides and regular asymmetric slot waveguides fabricated in a different photolithographic process.

Paper Details

Date Published: 4 February 2011
PDF: 6 pages
Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 792704 (4 February 2011); doi: 10.1117/12.876093
Show Author Affiliations
Alexander Spott, Univ. of Washington (United States)
Ran Ding, Univ. of Washington (United States)
Tom Baehr-Jones, Univ. of Washington (United States)
Woo-Joong Kim, Seattle Univ. (United States)
Xugang Xiong, Univ. of Washington (United States)
Richard Bojko, Univ. of Washington (United States)
Jean-Marc Fedeli, CEA-LETI (France)
Maryse Fournier, CEA-LETI (France)
Michael Hochberg, Univ. of Washington (United States)

Published in SPIE Proceedings Vol. 7927:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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