
Proceedings Paper
System tolerance analysis of dual-advantage spectrographic system based on coded apertureFormat | Member Price | Non-Member Price |
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Paper Abstract
Traditional dispersive spectrographic systems based on single slits cannot achieve dual advantages simultaneously and
statically. A novel dual advantages system model for dispersive spectrographic system appears and the traditional entrance
slit is replaced by a coded aperture based on orthogonal independent column codes. The extended aperture lets more energy
enter the system and the independence of the codes helps to avoid degradation of the spectral resolution. On the basis of the
derivation of system model, this paper emphasizes on system tolerance analysis, to find out the key factors which affect the
realization and performance of the system model. First, the influences of inaccurate system adjustment and calibrations on
system performance were studied. The standard methods for system adjustment and calibrations were represented. Then,
simulations were carried out to study the influence of several abnormal situations of the coded aperture on system
performance, which includes the existing of error fabrication and imperfect illumination of the coded aperture. The
analysis result shows that the system can still function normally when the coded aperture has a fabrication error rate of 30%
or severe imperfect illumination of the coded aperture.
Paper Details
Date Published: 9 November 2010
PDF: 9 pages
Proc. SPIE 7849, Optical Design and Testing IV, 78492X (9 November 2010); doi: 10.1117/12.871670
Published in SPIE Proceedings Vol. 7849:
Optical Design and Testing IV
Yongtian Wang; Julie Bentley; Chunlei Du; Kimio Tatsuno; Hendrik P. Urbach, Editor(s)
PDF: 9 pages
Proc. SPIE 7849, Optical Design and Testing IV, 78492X (9 November 2010); doi: 10.1117/12.871670
Show Author Affiliations
Feihong Yu, Zhejiang Univ. (China)
Published in SPIE Proceedings Vol. 7849:
Optical Design and Testing IV
Yongtian Wang; Julie Bentley; Chunlei Du; Kimio Tatsuno; Hendrik P. Urbach, Editor(s)
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