Proceedings Paper
Distributed Bragg reflector mirror with a double-wavelength reflection: design and calculation| Format | Member Price | Non-Member Price |
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Paper Abstract
We designed a distributed Bragg reflector mirror with a double-wavelength reflection, which can be used into opticallypumped
vertical external cavity surface emitting lasers. This kind of mirror can reflect both the lasing light as a
resonance mirror and the pumping light to reflect the pumping light back into absorbing area for increasing the
absorption efficiency and improving the thermal characteristics of the laser device. By using GaAs/AlGaAs
heterostructure layers and material data, the optical characteristics of the distributed Bragg reflector mirror with a double
wavelength reflection at two peaks was calculated. From the calculated results, the two reflection peaks occur at 808nm
and 980nm just as the structure design. The reflectivity can be more than 99% for 25-pair DBR. The reflection band
width is about 20nm and 25nm for the 808nm and 980nm peaks respectively. This can give a flexibility selection for the
double-wavelength distributed Bragg reflector structure design.
Paper Details
Date Published: 12 November 2010
PDF: 7 pages
Proc. SPIE 7844, Semiconductor Lasers and Applications IV, 78440Z (12 November 2010); doi: 10.1117/12.870623
Published in SPIE Proceedings Vol. 7844:
Semiconductor Lasers and Applications IV
Ning-Hua Zhu; Jinmin Li; Farzin Amzajerdian; Hiroyuki Suzuki, Editor(s)
PDF: 7 pages
Proc. SPIE 7844, Semiconductor Lasers and Applications IV, 78440Z (12 November 2010); doi: 10.1117/12.870623
Show Author Affiliations
Changling Yan, Changchun Univ. of Science and Technology (China)
Li Xu, Changchun Univ. of Science and Technology (China)
Yuan Feng, Changchun Univ. of Science and Technology (China)
Yongqin Hao, Changchun Univ. of Science and Technology (China)
Yun Deng, Changchun Univ. of Science and Technology (China)
Li Xu, Changchun Univ. of Science and Technology (China)
Yuan Feng, Changchun Univ. of Science and Technology (China)
Yongqin Hao, Changchun Univ. of Science and Technology (China)
Yun Deng, Changchun Univ. of Science and Technology (China)
Yingjie Zhao, Changchun Univ. of Science and Technology (China)
Jingchang Zhong, Changchun Univ. of Science and Technology (China)
Chunyu Tian, Changchun Univ. of Science and Technology (China)
Xiao Jia, Changchun Univ. of Science and Technology (China)
Jingchang Zhong, Changchun Univ. of Science and Technology (China)
Chunyu Tian, Changchun Univ. of Science and Technology (China)
Xiao Jia, Changchun Univ. of Science and Technology (China)
Published in SPIE Proceedings Vol. 7844:
Semiconductor Lasers and Applications IV
Ning-Hua Zhu; Jinmin Li; Farzin Amzajerdian; Hiroyuki Suzuki, Editor(s)
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