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Proceedings Paper

Soft UV-NIL at the 12.5 nm scale
Author(s): G. Kreindl; M. Kast; D. Treiblmayr; T. Glinsner; E. Platzgummer; H. Loeschner; P. Joechl; S. Eder-Kapl; T. Nartz; M. Muehlberger; I. Bergmair; M. Boehm; R. Schoeftner
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Paper Abstract

Nanoimprint technology already demonstrated high resolution capability using hard master stamps in the mid 90's. Considering this as a well known technology, there are still restrictions making nanoimprint lithography (NIL) a competitive "next generation lithography" technique. This paper will address limitations in regard to large area master stamp manufacturing, resolution and lifetime using soft UV-NIL imprint lithography on stamps fabricated by massively parallel ion beam lithography provided by the CHARPAN tool. It provides detailed information of sub- 15 nm (dots, grids and lines) replication processes at master fabrication, working stamp replication and imprinting.

Paper Details

Date Published: 4 April 2011
PDF: 7 pages
Proc. SPIE 7970, Alternative Lithographic Technologies III, 79701M (4 April 2011);
Show Author Affiliations
G. Kreindl, EV Group, E. Thallner GmbH (Austria)
M. Kast, EV Group, E. Thallner GmbH (Austria)
D. Treiblmayr, EV Group, E. Thallner GmbH (Austria)
T. Glinsner, EV Group, E. Thallner GmbH (Austria)
E. Platzgummer, IMS Nanofabrication AG (Austria)
H. Loeschner, IMS Nanofabrication AG (Austria)
P. Joechl, IMS Nanofabrication AG (Austria)
S. Eder-Kapl, IMS Nanofabrication AG (Austria)
T. Nartz, IMS Nanofabrication AG (Austria)
M. Muehlberger, PROFACTOR GmbH (Austria)
I. Bergmair, PROFACTOR GmbH (Austria)
M. Boehm, PROFACTOR GmbH (Austria)
R. Schoeftner, PROFACTOR GmbH (Austria)

Published in SPIE Proceedings Vol. 7970:
Alternative Lithographic Technologies III
Daniel J. C. Herr, Editor(s)

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