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Proceedings Paper

Cell projection use and multi column approach for throughput enhancement of EBDW system
Author(s): Akio Yamada; Yoshihisa Ooae
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Paper Abstract

The authors proposed a throughput enhancement of an e-beam direct writer by the combination of three key technologies; multi column cell, character projection, and high current density column technologies. They have finished proof-of-concept evaluations of multi column cell and character projection in the MASK-D2I project of ASET, including mix-and-match overlay results of better than 5nm. They found adequate conditions for the application of these three technologies to achieve the throughput above 5 wafers per hour in an e-beam direct writer.

Paper Details

Date Published: 24 September 2010
PDF: 8 pages
Proc. SPIE 7823, Photomask Technology 2010, 78231H (24 September 2010); doi: 10.1117/12.868975
Show Author Affiliations
Akio Yamada, Advantest Corp. (Japan)
Yoshihisa Ooae, Advantest Corp. (Japan)

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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