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Proceedings Paper

Submicrometer-resolution mapping of ultraweak 355-nm absorption in HfO2 monolayers using photothermal heterodyne imaging
Author(s): S. Papernov; A. Tait; W. Bittle; A. W. Schmid; J. B. Oliver; P. Kupinski
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Paper Abstract

Nanosecond-pulse UV-laser-damage initiation in multilayer coatings comprised from metal oxide as a high-index component, and silica oxide as a low-index material, is strongly linked to metal oxide. The nature of the absorbing species and their physical properties remain unknown because of extremely small sizes. Previous experimental evidence provided by high-resolution mapping of damage morphology points to a few-nanometer scale of these absorbers. This work demonstrates submicrometer mapping of 355-nm absorption in HfO2 monolayers using a recently developed photothermal heterodyne imaging technique. Comparison of absorption maps with spatial distribution of UV pulsed-laser- induced damage morphology allows one to better estimate the size and densities of nanoscale absorbing defects in hafnia thin films. Possible defect-formation mechanisms are discussed.

Paper Details

Date Published: 30 November 2010
PDF: 10 pages
Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420A (30 November 2010); doi: 10.1117/12.868236
Show Author Affiliations
S. Papernov, Univ. of Rochester (United States)
A. Tait, Univ. of Rochester (United States)
W. Bittle, Univ. of Rochester (United States)
A. W. Schmid, Univ. of Rochester (United States)
J. B. Oliver, Univ. of Rochester (United States)
P. Kupinski, Univ. of Rochester (United States)

Published in SPIE Proceedings Vol. 7842:
Laser-Induced Damage in Optical Materials: 2010
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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