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Proceedings Paper

Pinhole defect study and process optimization
Author(s): Won-Hee Chae; Guen-Ho Hwang; Soon-Kyu Seo; Dae-Han Kim; Dong-Heok Lee; Moon-Hwan Choi; Sang-Soo Choi; Dong-Gun Kim; Doo-Hoon Geum; Gi-Su Nam
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Paper Abstract

Positive CAR(Chemically Amplified Resist) is exposed by electron beam and PAGs(Photo Acid Generator) of photoresist release acids. Protecting groups of exposed polymers are de-protected by the acids and unexposed polymers still keep having protecting groups. It brings out dissolution difference between exposed and unexposed photoresist in develop process. Unexposed photoresist should be remained after develop process as much as needed for patterning. However, we have observed that unexposed photoresist also can be dissolved by developer droplet with hundreds micrometer size. It resulted in photoresist pinholes after develop process and clear defects after dry etching and photoresist stripping. Firstly, we have studied the pinhole defect formation mechanism by verifying the difference between normal develop process and developer droplet. It was confirmed that the dissolution difference are caused by phase environment difference, 2 phases(solid - liquid) for normal develop process and 3 phases(solid - liquid - air) at meniscus boundary for developer droplet. It also can be explained on different dissolution rate by droplet size. Also, possible defect types by developer droplet have been reviewed through process simulation to narrow down the critical steps in develop process. Besides, some of easy accessible process parameters have been evaluated to see whether they are effective or not for clear defect reduction.

Paper Details

Date Published: 27 May 2010
PDF: 8 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 774812 (27 May 2010); doi: 10.1117/12.867968
Show Author Affiliations
Won-Hee Chae, PKL Co., Ltd. (Korea, Republic of)
Guen-Ho Hwang, PKL Co., Ltd. (Korea, Republic of)
Soon-Kyu Seo, PKL Co., Ltd. (Korea, Republic of)
Dae-Han Kim, PKL Co., Ltd. (Korea, Republic of)
Dong-Heok Lee, PKL Co., Ltd. (Korea, Republic of)
Moon-Hwan Choi, PKL Co., Ltd. (Korea, Republic of)
Sang-Soo Choi, PKL Co., Ltd. (Korea, Republic of)
Dong-Gun Kim, SNS TECH Corp. (Korea, Republic of)
Doo-Hoon Geum, SNS TECH Corp. (Korea, Republic of)
Gi-Su Nam, SNS TECH Corp. (Korea, Republic of)

Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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