
Proceedings Paper
Simulation analysis and structure optimization of the polishing disc with the tiny-grinding wheel cluster based on MR effectFormat | Member Price | Non-Member Price |
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Paper Abstract
A new planarization technique with an instantaneous tiny-grinding wheel cluster that is based on the magnetorheological
(MR) effect is presented in this paper. The B-H curve of the MR polishing fluid is calculated, and the results show that
the B-H curve is nearly linear and its relative magnetic permeability is about 2.63. Based on the above results, three
designs of the polishing disc with the tiny-grinding wheel cluster are analyzed by using the electromagnetic field finite
element simulation software. The simulation results show that the design where the magnetic poles are fixed alternately
and contrarily to form a closed magnetic circuit has the optimum effect.
Paper Details
Date Published: 6 October 2010
PDF: 6 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76550W (6 October 2010); doi: 10.1117/12.867524
Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)
PDF: 6 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76550W (6 October 2010); doi: 10.1117/12.867524
Show Author Affiliations
Jiabin Lu, Guangdong Univ. of Technology (China)
Qiusheng Yan, Guangdong Univ. of Technology (China)
Aijun Tang, Foxconn Super Precision Mechanical Business Group (China)
Qiusheng Yan, Guangdong Univ. of Technology (China)
Aijun Tang, Foxconn Super Precision Mechanical Business Group (China)
Weiqiang Gao, Guangdong Univ. of Technology (China)
Lingye Kong, Guangdong Univ. of Technology (China)
Lingye Kong, Guangdong Univ. of Technology (China)
Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)
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