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Proceedings Paper

Assessing equipment and process related electrostatic risks to reticles with E-Reticle system
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Paper Abstract

The E-ReticleTM system was used to assess the electrostatic risks from mask manufacturing equipment and processes. Test results showed that some mechanical operations of the equipment examined may cause electrostatic potential differences in a production reticle higher than the ITRS recommended specifications, which may bring electrostatic risks to the reticle. E-ReticleTM data also indicated that the processes play an important role in controlling electrostatic potentials in the reticle. The E-ReticleTM system can be used as an in-situ equipment assessment tool, as well as a process optimization device.

Paper Details

Date Published: 26 May 2010
PDF: 10 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481C (26 May 2010);
Show Author Affiliations
Richard Tu, Benchmark Technologies Inc. (United States)
Thomas Sebald, ESTION GmbH & Co. KG (Germany)

Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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