A fast model-based technique for SRAF placements is proposed in this paper. This technique first constructed an image pixel map with values presenting the sensitivity of improving process window on the desired pattern. The sensitivity value was derived based on contrast improvement with a defocus model. Then high value pixels were selected and constructed to form SRAF with MRC regulations. This technique does not require iterations to produce SRAF and achieves very fast runtime with simple mask shapes, thus can be used in full-chip productions. We called this technique the SRAF guidance map, SGM

Date Published: 24 September 2010
PDF: 9 pages
Proc. SPIE 7823, Photomask Technology 2010, 78233Q (24 September 2010); doi: 10.1117/12.866139

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)