Proceedings Paper
How to match without copying: an approach for APSM mask process matching using aerial imaging| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
For mask signature matching in the case of alternating phase-shifting mask it is shown that it is can be achieved using
matching of aerial imaging. This is in contrast to the traditional approach of manufacturing an identical copy of the
reference mask. Beside description of the method AIMS and wafer data are shown that proof its successful application
on a product mask.
Paper Details
Date Published: 24 September 2010
PDF: 11 pages
Proc. SPIE 7823, Photomask Technology 2010, 78231Z (24 September 2010); doi: 10.1117/12.865236
Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)
PDF: 11 pages
Proc. SPIE 7823, Photomask Technology 2010, 78231Z (24 September 2010); doi: 10.1117/12.865236
Show Author Affiliations
M. Sczyrba, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
C. Romeo, Numonyx (Italy)
F. Schurack, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
C. Romeo, Numonyx (Italy)
F. Schurack, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)
© SPIE. Terms of Use
