
Proceedings Paper
Optical design and multi-objective optimization for u-type 2X zoom projection opticsFormat | Member Price | Non-Member Price |
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Paper Abstract
When a U-type 2X zoom optical lens design for Digital Light Processing (DLP) projector was designed by CODE V, we
found that the MTF and RI values at position 1 of the maximum field are less then 10% (MTF) and 60% (RI) at 50 lp/mm, which didn't conform the lowest performance. But if we corrected the design to improve the value of MTF, then RI value would become lower and probably not match the requirement relatively. In order to achieve the optimal values of MTF and RI simultaneously, we employed the integration of the Taguchi method and the robust multiple criterion optimization (RMCO) approach to solve such a multiple objective (MTF and RI) optimization problem.
Paper Details
Date Published: 6 October 2010
PDF: 6 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 765529 (6 October 2010); doi: 10.1117/12.865185
Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)
PDF: 6 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 765529 (6 October 2010); doi: 10.1117/12.865185
Show Author Affiliations
Jung-Hung Sun, National Kaohsiung First Univ. of Science and Technology (Taiwan)
Yi-Chin Fang, National Kaohsiung First Univ. of Science and Technology (Taiwan)
Yi-Chin Fang, National Kaohsiung First Univ. of Science and Technology (Taiwan)
Bo-Ren Hsueh, National Kaohsiung First Univ. of Science and Technology (Taiwan)
Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)
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