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Proceedings Paper

Advanced photomask cleaning for 32nm and beyond
Author(s): Jong-Min Kim; Young-Jin An; Dong-Seok Lee; Hyo-Jin Ahn; Hyun-Ju Jung; Jae-Chul Lee; Dong-Heok Lee; Sang-Soo Choi
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Paper Abstract

High PRE (Particle removal efficiency) and damage free cleaning became main cleaning challenges over haze prevention in photomask industry, nowadays. SRAF (Sub-resolution assist feature) size became small down below 0.1um as pattern size become small. Acoustic frequency and power is the main parameter to increase PRE in photomask cleaning. 1 MHz of acoustic frequency was good enough to remove particles and soft defects until recently. But it has shown pattern damages for SB (Scattering bar) size of below 0.1um unfortunately. In this paper, we optimized photomask cleaning process to achieve high PRE and low pattern damage. Its haze prevention capability and cycle cleaning durability was verified with in-house-built HATB and AIMS, respectively.

Paper Details

Date Published: 24 September 2010
PDF: 8 pages
Proc. SPIE 7823, Photomask Technology 2010, 78232X (24 September 2010); doi: 10.1117/12.864532
Show Author Affiliations
Jong-Min Kim, PKL Co., Ltd. (Korea, Republic of)
Young-Jin An, PKL Co., Ltd. (Korea, Republic of)
Dong-Seok Lee, PKL Co., Ltd. (Korea, Republic of)
Hyo-Jin Ahn, PKL Co., Ltd. (Korea, Republic of)
Hyun-Ju Jung, PKL Co., Ltd. (Korea, Republic of)
Jae-Chul Lee, PKL Co., Ltd. (Korea, Republic of)
Dong-Heok Lee, PKL Co., Ltd. (Korea, Republic of)
Sang-Soo Choi, PKL Co., Ltd. (Korea, Republic of)

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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