Traditionally, Mask Data Preparation (MDP) flow for Variable Shape E-Beam (VSB) writers has been optimized in a generic fashion to minimize slivers and reduce shot count while maintaining data symmetry. To date, this approach has been sufficient and allowed the mask industry to meet requirements for CD uniformity, registration, and write time. However, ever tighter error budgets and increasing pattern complexity are driving a need for writer-specific optimization of MDP. This paper summarizes the joint development effort between Synopsys and JEOL to optimize MDP fractures for the JEOL platform. The advantages and challenges of platform specific optimization are discussed.

Date Published: 26 May 2010
PDF: 10 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481R (26 May 2010); doi: 10.1117/12.864159

Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)