Proceedings Paper
In situ long trace profiler for measurement of Wolter type-I mirror| Format | Member Price | Non-Member Price |
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Paper Abstract
The surface profile of Wolter type-I mirror has a great impact on the performance of Solar X-ray Telescope. According to the existing fabrication instrument and experimental conditions in our lab, an
in situ Long Trace Profiler is developed and set up on the fabrication instrument in order to measure the surface profile of Wolter mirror in real time during fabrication process. Its working mechanism, structural parameters and data processing algorithm are investigated. The prototype calibrated by a standard plane mirror is used to measure a sample of Wolter type-I mirror. The results show that our prototype can achieve an accuracy of 2.6μrad rms for slope error with a stability of 1.33μrad during the whole measurement period. This can meet further fabrication requirements.
Paper Details
Date Published: 1 September 2010
PDF: 10 pages
Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 78010L (1 September 2010);
Published in SPIE Proceedings Vol. 7801:
Advances in Metrology for X-Ray and EUV Optics III
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)
PDF: 10 pages
Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 78010L (1 September 2010);
Show Author Affiliations
Tian Gang Cui, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Yong Gang Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Graduate School of the Chinese Academy of Sciences (China)
Yong Gang Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Wen Sheng Ma, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Bo Chen, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Bo Chen, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Published in SPIE Proceedings Vol. 7801:
Advances in Metrology for X-Ray and EUV Optics III
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)
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