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Proceedings Paper

Nanofabrication with a helium ion microscope
Author(s): Diederik Maas; Emile van Veldhoven; Ping Chen; Vadim Sidorkin; Huub Salemink; Emile . van der Drift; Paul Alkemade
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Paper Abstract

The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well as a mechanism for very precise nanofabrication. The low proximity effects, due to the low yield of backscattered ions and the confinement of the forward scattered ions into a narrow cone, enable patterning of ultra-dense sub-10 nm structures. This paper presents various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion beam induced deposition.

Paper Details

Date Published: 1 April 2010
PDF: 10 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 763814 (1 April 2010); doi: 10.1117/12.862438
Show Author Affiliations
Diederik Maas, TNO (Netherlands)
Emile van Veldhoven, TNO (Netherlands)
Ping Chen, Technische Univ. Delft (Netherlands)
Vadim Sidorkin, Technische Univ. Delft (Netherlands)
Huub Salemink, Technische Univ. Delft (Netherlands)
Emile . van der Drift, Technische Univ. Delft (Netherlands)
Paul Alkemade, Technische Univ. Delft (Netherlands)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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