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Proceedings Paper

A novel adaptive bimorph focusing mirror and wavefront corrector with sub-nanometre dynamical figure control
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Paper Abstract

We present the design, fabrication and characterization of a novel adaptive X-ray optic by bringing together bimorph adaptive technology and the novel Elastic Emission Machining "super-polishing" technique. This super-polished adaptive mirror provides variable focal distance and local figure control in the sub-nm range. The optic has the potential to generate distortion-free beams, and enable wavefront control.

Paper Details

Date Published: 1 September 2010
PDF: 9 pages
Proc. SPIE 7803, Adaptive X-Ray Optics, 780303 (1 September 2010); doi: 10.1117/12.861593
Show Author Affiliations
Kawal J. S. Sawhney, Diamond Light Source Ltd. (United Kingdom)
Simon G. Alcock, Diamond Light Source Ltd. (United Kingdom)
Riccardo Signorato, Bruker ASC GmbH (Germany)

Published in SPIE Proceedings Vol. 7803:
Adaptive X-Ray Optics
Ali M. Khounsary; Stephen L. O'Dell; Sergio R. Restaino, Editor(s)

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