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Proceedings Paper

In situ control of roughness of processed surfaces by reflectometric method
Author(s): Yuriy D. Filatov; Oleksandr Yu. Filatov; Uwe Heisel; Michael Storchak; Guy Monteil
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Paper Abstract

It is demonstrated that the removal rate in polishing optic materials decreases exponentially with increasing bond energy in these materials and the polished surface roughness depends on the ratio of natural frequencies of molecular fragments on the tool and workpiece surfaces. The dependences of polished surface roughness on the slime particle size, permit an optimal choice of powders for a bound-abrasive polishing tools, which will ensure a required polished surface quality. The dependences of the polished surface microprofile parameters on the coordinate of a zone under study, which were described by periodic functions, do represent the effects that occur in the tool-workpiece contact zone. The optical monitoring system, the device for giving of the technological environment in a zone of contact of the tool and a processed detail and a technique of adjustment of the machine tool for finishing processing of precision optic surfaces are described. The relation of intensity of the beam reflected from a surface, to intensity of a falling beam allows to estimate a reflexion index in situ. Increase of reflexion index in process of roughness decrease is established. Possibility of active quality assurance of precision surfaces in the course of processing is shown.

Paper Details

Date Published: 14 May 2010
PDF: 9 pages
Proc. SPIE 7718, Optical Micro- and Nanometrology III, 77181J (14 May 2010);
Show Author Affiliations
Yuriy D. Filatov, Bakul Institute for Superhard Materials (Ukraine)
Oleksandr Yu. Filatov, Bakul Institute for Superhard Materials (Ukraine)
Uwe Heisel, Univ. Stuttgart (Germany)
Michael Storchak, Univ. Stuttgart (Germany)
Guy Monteil, National Engineering Institute in Mechanics and Microtechnologies (France)

Published in SPIE Proceedings Vol. 7718:
Optical Micro- and Nanometrology III
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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