Share Email Print

Proceedings Paper

Nanoimprint lithography for solar cell texturisation
Author(s): Hubert Hauser; Pauline Berger; Bernhard Michl; Claas Müller; Sebastian Schwarzkopf; Martin Hermle; Benedikt Bläsi
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The highest efficiency silicon solar cells are fabricated using defined texturing schemes by applying etching masks. However, for an industrial production of solar cells the usage of photolithographic processes to pattern these etching masks is too consumptive. Especially for multicrystalline silicon, there is a huge difference in the quality of the texture realized in high efficiency laboratory scale and maskless industrial scale fabrication. In this work we are describing the topography of a desired texture for solar cell front surfaces. We are investigating UV-nanoimprint lithography (UV-NIL) as a potential technology to substitute photolithography and so to enable the benefits resulting of a defined texture in industrially feasible processes. Besides the reduced process complexity, UV-NIL offers new possibilities in terms of structure shape and resolution of the generated etching mask. As mastering technology for the stamps we need in the UV-NIL, interference lithography is used. The UV-NIL process is conducted using flexible UV-transparent stamps to allow a full wafer process. The following texturisation process is realized via crystal orientation independent plasma etching to tap the full potential of the presented process chain especially for multicrystalline silicon. The textured surfaces are characerised optically using fourier spectroscopy.

Paper Details

Date Published: 13 May 2010
PDF: 9 pages
Proc. SPIE 7716, Micro-Optics 2010, 77160X (13 May 2010);
Show Author Affiliations
Hubert Hauser, Fraunhofer Institute for Solar Energy Systems (Germany)
Pauline Berger, Fraunhofer Institute for Solar Energy Systems (Germany)
Bernhard Michl, Fraunhofer Institute for Solar Energy Systems (Germany)
Claas Müller, Univ. Freiburg (Germany)
Sebastian Schwarzkopf, Fraunhofer Institute for Solar Energy Systems (Germany)
Martin Hermle, Fraunhofer Institute for Solar Energy Systems (Germany)
Benedikt Bläsi, Fraunhofer Institute for Solar Energy Systems (Germany)

Published in SPIE Proceedings Vol. 7716:
Micro-Optics 2010
Hugo Thienpont; Peter Van Daele; Jürgen Mohr; Hans Zappe, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?