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Proceedings Paper

Nanostructure-based antireflection coatings for EO/IR sensor applications
Author(s): Ashok K. Sood; Roger E. Welser; Yash R. Puri; David J. Poxson; Martin F. Schubert; Jaehee Cho; E. Fred Schubert; Dennis L. Polla; Martin B. Soprano
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Paper Abstract

EO/IR Nanosensors are being developed for a variety of Defense and Commercial Systems Applications. These include UV, Visible, NIR, MWIR and LWIR Nanotechnology based Sensors. The conventional SWIR Sensors use InGaAs based IR Focal Plane Array (FPA) that operate in 1.0-1.8 micron region. Similarly, MWIR Sensors use InSb or HgCdTe based FPA that is sensitive in 3-5 micron region. More recently, there is effort underway to evaluate low cost SiGe visible and near infrared band that covers from 0.4 to 1.6 micron. One of the critical technologies that will enhance the EO/IR sensor performance is the development of high quality nanostructure based antireflection coating. Prof. Fred Schubert and his group have used the TiO2 and SiO2 graded-index nanowires / nanorods deposited by oblique-angle deposition, and, for the first time, demonstrated their potential for antireflection coatings by virtually eliminating Fresnel reflection from an AlN-air interface over the UV band. This was achieved by controlling the refractive index of the TiO2 and SiO2 nanorod layers, down to a minimum value of n = 1.05, the lowest value so far reported. In this paper, we will discuss our modeling approach and experimental results for using oblique angle nanowires growth technique for extending the application for UV, Visible and NIR sensors and their utility for longer wavelength application.

Paper Details

Date Published: 5 May 2010
PDF: 9 pages
Proc. SPIE 7679, Micro- and Nanotechnology Sensors, Systems, and Applications II, 76792G (5 May 2010); doi: 10.1117/12.852706
Show Author Affiliations
Ashok K. Sood, Magnolia Optical Technologies, Inc. (United States)
Roger E. Welser, Magnolia Optical Technologies, Inc. (United States)
Yash R. Puri, Magnolia Optical Technologies, Inc. (United States)
David J. Poxson, Rensselaer Polytechnic Institute (United States)
Martin F. Schubert, Rensselaer Polytechnic Institute (United States)
Jaehee Cho, Rensselaer Polytechnic Institute (United States)
E. Fred Schubert, Rensselaer Polytechnic Institute (United States)
Dennis L. Polla, DARPA/Microelectronics Technology Office (United States)
Martin B. Soprano, DARPA Programs Office, U.S. Army (United States)

Published in SPIE Proceedings Vol. 7679:
Micro- and Nanotechnology Sensors, Systems, and Applications II
Thomas George; M. Saif Islam; Achyut Kumar Dutta, Editor(s)

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