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Proceedings Paper

Self-assembling materials for lithographic patterning: overview, status, and moving forward
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Paper Abstract

We survey several different approaches wherein self-assembly has been applied in lithographic patterning. As part of this survey, we trace the evolution of block copolymer directed self-assembly used as lithographic technique, and summarize its current status. We compare a process based on block copolymer lithography with an equivalent process based on spacer pitch division. We conclude with a brief discussion of design issues and future research in the field.

Paper Details

Date Published: 1 April 2010
PDF: 11 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370G (1 April 2010); doi: 10.1117/12.852230
Show Author Affiliations
William Hinsberg, IBM Almaden Research Ctr. (United States)
Joy Cheng, IBM Almaden Research Ctr. (United States)
Ho-Cheol Kim, IBM Almaden Research Ctr. (United States)
Daniel P. Sanders, IBM Almaden Research Ctr. (United States)

Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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