
Proceedings Paper
Single cell electroporation using proton beam fabricated biochipsFormat | Member Price | Non-Member Price |
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Paper Abstract
We report the design and fabrication of a novel single cell electroporation biochip fabricated by the Proton Beam Writing
technique (PBW), a new technique capable of direct-writing high-aspect-ratio nano and microstructures. The biochip
features nickel micro-electrodes with straight-side walls between which individual cells are positioned. By applying
electrical impulses across the electrodes, SYTOX® Green nucleic acid stain is incorporated into mouse neuroblastoma
(N2a) cells. When the stain binds with DNA inside the cell nucleus, green fluorescence is observed upon excitation from
a halogen lamp. Three parameters; electric field strength, pulse duration, and the number of pulses have been considered
and optimized for the single cell electroporation. The results show that our biochip gives successfully electroporated
cells . This single cell electroporation system represents a promising method for investigating the introduction of a wide
variety of fluorophores, nanoparticles, quantum dots, DNAs and proteins into cells.
Paper Details
Date Published: 13 May 2010
PDF: 9 pages
Proc. SPIE 7716, Micro-Optics 2010, 77160V (13 May 2010); doi: 10.1117/12.850657
Published in SPIE Proceedings Vol. 7716:
Micro-Optics 2010
Hugo Thienpont; Peter Van Daele; Jürgen Mohr; Hans Zappe, Editor(s)
PDF: 9 pages
Proc. SPIE 7716, Micro-Optics 2010, 77160V (13 May 2010); doi: 10.1117/12.850657
Show Author Affiliations
S. Homhuan, National Univ. of Singapore (Singapore)
B. Zhang, National Univ. of Singapore (Singapore)
F.-S. Sheu, National Univ. of Singapore (Singapore)
B. Zhang, National Univ. of Singapore (Singapore)
F.-S. Sheu, National Univ. of Singapore (Singapore)
A. A. Bettiol, National Univ. of Singapore (Singapore)
F. Watt, National Univ. of Singapore (Singapore)
F. Watt, National Univ. of Singapore (Singapore)
Published in SPIE Proceedings Vol. 7716:
Micro-Optics 2010
Hugo Thienpont; Peter Van Daele; Jürgen Mohr; Hans Zappe, Editor(s)
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