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Proceedings Paper

Low-temperature crystallization of TiO2 films by sputter deposition
Author(s): Yasunori Taga; Naoomi Yamada
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Paper Abstract

Crystalline TiO2 film was formed on PET(polyethlene terephthalate) film by radio frequency sputter deposition method using a sintered TiO2 target by adding H2O gas to Ar gas for sputtering. X-ray diffraction analysis revealed that the crystal structure of the film of 100 nm thick was confirmed to be anatase crystallites of TiO2. In order to elucidate the mechanism of low temperature crystallization thus observed, direct measurement of surface temperature of growing films during sputter deposition was carried out by two methods of an infrared thermometer from the outside of vacuum chamber and a thermocouple attached to the growing film surface. Upon the beginning of sputter deposition in Ar gas, film temperature increased rapidly and became constant at 120°C after 30 min. Addition of H2O gas to Ar gas for sputtering resulted in further increase in film temperature and reached to 230 °C depending on the deposition conditions. Furthermore, photocatalytic performance of decomposition of methylene blue was examined to be enhanced remarkably as a result of crystallization of the film. It was concluded that low temperature crystallization of TiO2 film by sputter deposition was explained in terms of local heating of thin shallow surface region of growing film by kinetic energy deposition of sputtered particles.

Paper Details

Date Published: 28 April 2010
PDF: 7 pages
Proc. SPIE 7683, Energy Harvesting and Storage: Materials, Devices, and Applications, 768310 (28 April 2010); doi: 10.1117/12.849297
Show Author Affiliations
Yasunori Taga, Chubu Univ. (Japan)
Naoomi Yamada, Chubu Univ. (Japan)

Published in SPIE Proceedings Vol. 7683:
Energy Harvesting and Storage: Materials, Devices, and Applications
Nibir K. Dhar; Priyalal S. Wijewarnasuriya; Achyut Kumar Dutta, Editor(s)

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