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Proceedings Paper

High volume jet and flash imprint lithography for discrete track patterned media
Author(s): Zhengmao Ye; Rick Ramos; Cynthia B. Brooks; Paul Hellebrekers; Scott Carden; Dwayne LaBrake
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Paper Abstract

The Jet and Flash Imprint Lithography (J-FIL) process uses drop dispensing of UV curable resists for high resolution patterning. Several applications, including patterned media, are better, and more economically served by a full substrate patterning process since the alignment requirements are minimal. Patterned media is particularly challenging because of the aggressive feature sizes necessary to achieve storage densities required for manufacturing beyond the current technology of perpendicular recording. In this paper, the key process steps for the application of J-FIL to pattern media fabrication are reviewed with special attention to the vapor adhesion layer and imprint performance at >300 disk per hour.

Paper Details

Date Published: 2 April 2010
PDF: 10 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371A (2 April 2010); doi: 10.1117/12.849226
Show Author Affiliations
Zhengmao Ye, Molecular Imprints, Inc. (United States)
Rick Ramos, Molecular Imprints, Inc. (United States)
Cynthia B. Brooks, Molecular Imprints, Inc. (United States)
Paul Hellebrekers, Molecular Imprints, Inc. (United States)
Scott Carden, Molecular Imprints, Inc. (United States)
Dwayne LaBrake, Molecular Imprints, Inc. (United States)

Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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