
Proceedings Paper
Considerations in source-mask optimization for logic applicationsFormat | Member Price | Non-Member Price |
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Paper Abstract
In the low k1 regime, optical lithography can be extended further to its limits by advanced computational lithography
technologies such as Source-Mask Optimization (SMO) without applying costly double patterning techniques. By cooptimizing
the source and mask together and utilizing new capabilities of the advanced source and mask manufacturing,
SMO promises to deliver the desired scaling with reasonable lithography performance. This paper analyzes the
important considerations when applying the SMO approach to global source optimization in random logic applications.
SMO needs to use realistic and practical cost functions and model the lithography process with accurate process data.
Through the concept of source point impact factor (SPIF), this study shows how optimization outputs depend on SMO
inputs, such as limiting patterns in the optimization. This paper also discusses the modeling requirements of lithography
processes in SMO, and it shows how resist blur affect optimization solutions. Using a logic test case as example, the
optimized pixelated source is compared with the non-optimized source and other optimized parametric sources in the
verification. These results demonstrate the importance of these considerations during optimization in achieving the best
possible SMO results which can be applied successfully to the targeted lithography process.
Paper Details
Date Published: 11 March 2010
PDF: 12 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401J (11 March 2010); doi: 10.1117/12.848865
Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)
PDF: 12 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401J (11 March 2010); doi: 10.1117/12.848865
Show Author Affiliations
Yunfei Deng, GLOBALFOUNDRIES Inc. (United States)
Yi Zou, GLOBALFOUNDRIES Inc. (United States)
Kenji Yoshimoto, GLOBALFOUNDRIES Inc. (United States)
Yuansheng Ma, GLOBALFOUNDRIES Inc. (United States)
Yi Zou, GLOBALFOUNDRIES Inc. (United States)
Kenji Yoshimoto, GLOBALFOUNDRIES Inc. (United States)
Yuansheng Ma, GLOBALFOUNDRIES Inc. (United States)
Cyrus E. Tabery, GLOBALFOUNDRIES Inc. (United States)
Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)
Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)
Harry J. Levinson, GLOBALFOUNDRIES Inc. (United States)
Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)
Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)
Harry J. Levinson, GLOBALFOUNDRIES Inc. (United States)
Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)
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