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Proceedings Paper

LPP source system development for HVM
Author(s): David C. Brandt; Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Richard L. Sandstrom; Norbert R. Böwering; Georgiy O. Vaschenko; Oleh V. Khodykin; Alexander N. Bykanov; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Daniel J. Golich; Silvia De Dea; Richard R. Hou; Kevin M. O'Brien; Wayne J. Dunstan
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Paper Abstract

Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light source to support optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. The status of first generation High Volume Manufacturing (HVM) sources in production and of prototype source operation at a leading scanner manufacturer is discussed. The EUV power at intermediate focus is discussed and the lastest data is presented. An electricity consumption model is described, and our current product roadmap is shown.

Paper Details

Date Published: 20 March 2010
PDF: 6 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361I (20 March 2010); doi: 10.1117/12.848404
Show Author Affiliations
David C. Brandt, Cymer, Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
David W. Myers, Cymer, Inc. (United States)
Richard L. Sandstrom, Cymer, Inc. (United States)
Norbert R. Böwering, Cymer, Inc. (United States)
Georgiy O. Vaschenko, Cymer, Inc. (United States)
Oleh V. Khodykin, Cymer, Inc. (United States)
Alexander N. Bykanov, Cymer, Inc. (United States)
Shailendra N. Srivastava, Cymer, Inc. (United States)
Imtiaz Ahmad, Cymer, Inc. (United States)
Chirag Rajyaguru, Cymer, Inc. (United States)
Daniel J. Golich, Cymer, Inc. (United States)
Silvia De Dea, Cymer, Inc. (United States)
Richard R. Hou, Cymer, Inc. (United States)
Kevin M. O'Brien, Cymer, Inc. (United States)
Wayne J. Dunstan, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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