
Proceedings Paper
Angular distribution of debris from CO[sub]2[/sub] and YAG laser-produced tin plasmasFormat | Member Price | Non-Member Price |
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Paper Abstract
We investigated the angular dependence of atomic and ionic debris from CO2 and YAG laser-produced tin
plasmas. Several diagnostic techniques were employed for this study including a Faraday cup, witness
plates and subsequent x-ray photoelectron spectroscopic analysis, optical emission spectroscopy etc. It was
found that the debris emission from the Nd:YAG laser-produced plasmas fell sharply from the target
normal. In contrast, the debris emission from the CO2 laser-produced plasmas was almost constant at short
angles from the target normal. Our results also indicated that the plasma produced by the CO2 laser emitted
less atomic and ionic debris compared to a plasma produced by Nd:YAG laser.
Paper Details
Date Published: 20 March 2010
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763612 (20 March 2010); doi: 10.1117/12.848333
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763612 (20 March 2010); doi: 10.1117/12.848333
Show Author Affiliations
D. Campos, Purdue Univ. (United States)
R. W. Coons, Purdue Univ. (United States)
M. D. Fields, Purdue Univ. (United States)
R. W. Coons, Purdue Univ. (United States)
M. D. Fields, Purdue Univ. (United States)
M. Crank, Purdue Univ. (United States)
S. S. Harilal, Purdue Univ. (United States)
A. Hassanein, Purdue Univ. (United States)
S. S. Harilal, Purdue Univ. (United States)
A. Hassanein, Purdue Univ. (United States)
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
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