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Proceedings Paper

Quadratic blur kernels for latent image formation modeling
Author(s): Anatoly Burov
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Paper Abstract

A bilinear photoresist model is accurate, fast, and potentially reversible. Similar to other image-processing style (blur kernel) models, this model represents a transformation of an aerial image into a latent image. The key difference is the explicit recognition of the non-linearity of the process while retaining common signal processing architecture. By applying a Volterra series expansion to the reaction-diffusion functional, a high-accuracy representation of the process is obtained. Several methods for identifying the double-impulse response of the quadratic term of the series are discussed. Characterization is carried out based on the bi-harmonic signal sampling method of the Bilinear Transfer Function, the Fourier transform of the double-impulse spread function. Several photoresist systems are characterized, and strong quadratic behavior is observed for many. The resulting estimated BTF are presented, and their differences are discussed.

Paper Details

Date Published: 10 March 2010
PDF: 10 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76400P (10 March 2010); doi: 10.1117/12.848295
Show Author Affiliations
Anatoly Burov, Shanghai Microelectronics Equipment Corp. (China)

Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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