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Proceedings Paper

Maskless plasmonic lithography for patterning of one- and two-dimensional periodic features
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Paper Abstract

In this paper, a maskless single step multiple (two and four) beams surface plasmon interference lithographic configuration is proposed and illustrated experimentally so as to obtain interference pattern with resolution several orders less than the illumination source wavelength. This technique utilizes a custom made prism layer configuration to pattern both one dimensional (grating line) and two dimensional (dot array) periodic nanostructures on the recording medium. Both aluminum and silver metal films are used for the experimental study. Large area patterns of grating lines and dot arrays with feature size ≈ 90 nm were experimentally obtained using an exposure radiation of 364 nm wavelength.

Paper Details

Date Published: 2 April 2010
PDF: 8 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371G (2 April 2010); doi: 10.1117/12.847981
Show Author Affiliations
V. M. Murukeshan, Nanyang Technological Univ. (Singapore)
K. V. Sreekanth, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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