Proceedings Paper
Wavelength dependence of carbon contamination on mirrors with different capping layers| Format | Member Price | Non-Member Price |
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Paper Abstract
Optics contamination remains one of the challenges in extreme ultraviolet (EUV) lithography. In addition to the
desired wavelength near 13.5 nm (EUV), plasma sources used in EUV exposure tools emit a wide range of
out-of-band (OOB) wavelengths extending as far as the visible region. We present experimental results of
contamination rates of EUV and OOB light using a Xe plasma source and filters. Employing heated carbon
tape as a source of hydrocarbons, we have measured the wavelength dependence of carbon contamination
on a Ru-capped mirror. These results are compared to contamination rates on TiO2 and ZrO2 capping layers.
Paper Details
Date Published: 22 March 2010
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361X (22 March 2010); doi: 10.1117/12.847015
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361X (22 March 2010); doi: 10.1117/12.847015
Show Author Affiliations
Petros Thomas, Univ. at Albany (United States)
Leonid Yankulin, Univ. at Albany (United States)
Yashdeep Khopkar, Univ. at Albany (United States)
Rashi Garg, Univ. at Albany (United States)
Chimaobi Mbanaso, Univ. at Albany (United States)
Alin Antohe, Univ. at Albany (United States)
Leonid Yankulin, Univ. at Albany (United States)
Yashdeep Khopkar, Univ. at Albany (United States)
Rashi Garg, Univ. at Albany (United States)
Chimaobi Mbanaso, Univ. at Albany (United States)
Alin Antohe, Univ. at Albany (United States)
Yu-Jen Fan, Univ. at Albany (United States)
Gregory Denbeaux, Univ. at Albany (United States)
Samir Aouadi, Southern Illinois Univ. at Carbondale (United States)
Vibhu Jindal, SEMATECH North (United States)
Andrea Wüest, SEMATECH North (United States)
Gregory Denbeaux, Univ. at Albany (United States)
Samir Aouadi, Southern Illinois Univ. at Carbondale (United States)
Vibhu Jindal, SEMATECH North (United States)
Andrea Wüest, SEMATECH North (United States)
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
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